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非晶态Y5Ni95合金膜的霍尔效应
HALL EFFECT OF SPUTTERED AMORPHOUS Y5Ni95 FILMS
【摘要】 在1.5~300K温度范围内,研究了非品态Y5Ni95,溅射合金膜的霍尔效应。观察到该材料的正常霍尔系数Ro不随温度改变,Ro=—1.46×10-12Ω·cm/G;反常霍尔系数Rs值随温度增高而增大,其值从1.5K的—2.2×10-10变化至300K的—3.3×10-10Ω·cm/G。利用斜散射和边跳跃机制对此进行了讨论。
【Abstract】 We have studied the Hall effects of the sputtered amorphous Y5Ni95 films within the temperature range of 1.5-300 K. The ordinary Hall coefficient Ro=-1.46×10-12Ωcm/G and is independent of the temperature. The extraordinary Hall coefficient Rs increases with the increasing temperature, and changes from -2.2×10-10Ωcm/G at 1.5 K up to -3.3×10-10Ω. cm/G at 300 K. Such observed changes of R1 can be explained by the current mechanism of skew scattering and side jump.
- 【文献出处】 低温物理学报 ,Chinese Journal of Low Temperature Physics , 编辑部邮箱 ,1986年04期
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