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磁控溅射离子镀膜组织与相结构的电镜研究

The Transmission Electron Microscopic Investigation on the Structure and Phase Structure of the Magnetron-Sputtering Ion-Plating Films

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【作者】 王斐杰陈宝清王家祥牛铁永王玉魁朱英臣

【Author】 Wang Feijie, Chen Baoqing, Wang Jiaxian, Niu Tieyong, Wang Yukui, Zhu Yingchen Ion -Plating Research Section of the Materials Engineering Department, DIT

【机构】 大连工学院材料系离子工学研究室大连工学院材料系离子工学研究室

【摘要】 本文主要应用JEM-100CXⅡ型透射电镜研究了在C-u基材上磁控溅射离子镀Al及CrNi不锈钢时的沉积层组织与相结构。研究发现; 在一系列沉积工艺条件下,Cu基镀 CrNi不锈钢时,其涂层结构只含一种 Fe基 α相;镀 Al时,随基板偏压升高,可获得一系列新合金相,如;Al,AlCu,Al-2Cu-3,Al-4Cu-9,AlCu-3,AlCu-4,aCu等。这些结果将为进一步探索这类涂层的形成机理提供必要的理论与实验根据。

【Abstract】 This paper mainly investigates nito the structure and phase structure of de- position layer for the "Al/Cu" and "Cr-Nistainless steel/Cu" Magnetron-sputter- ing Ion-plating films by means of a transmission electron microscope which is JEM -100CX II type. It has been dicovered that the structure of the layer contains only one Fe-based α-phase in the "Cr-Ni stainless steel/Cu" films under a series of deposition parameters and there emerges a series of new phases -Al, AlCu, Al-2 Cu-3, Al-4Cu-9, AlCu-3, AlCu-4 and αCu,etc. in the "Al/Cu" films with a rise in the substrate’s bias. These results will provide theoretical and experimental basis for us to study mechanism on the formation of these kind of layers.

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