【摘要】 本文应用 Ｘ射线衍射分析和电子衍射分析研究了Ａ３钢基体磁控溅射离子镀铝 膜的相组成，结果表明，膜的相组成主要是基板负偏压所决定的。文中论述了正离子 对基板的溅射作用所引起的靶材原子和基板（基体）原子在基板上共同沉积的成膜机 理。更多还原

【Abstract】 The phases of the magnetron sputtering ion plating aluminum films on the matrix of A3 steel have been examined by means of X-ray diffraction analysis and TEM. The results show that the phases of the films are mainly dependent on the negative bias of the substrate. In this paper, the mechanism of formation of the films is described. The sputtering of positive ions at the substrate brings about target element(Al) ions and substrate element(Fe) ions. The ions of the two elements are mixed and deposited on the substrate, forming the magnetron sputtering ion aluminum plating film on the A3 steel substrate.更多还原