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倾斜蒸发的束流分布

FLUX DISTRIBUTION OF OBLIQUE EVAPORATION

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【作者】 江明珞

【Author】 Jiang Ming-luo Institute of Semiconductors,Chinese Academy of Sciences

【机构】 中国科学院半导体研究所

【摘要】 Ruth和Hirth用自己的模型计算了束流分布,但该分布只限于在正入射条件下使用。Svensson和Andersson用R&H模型计算了斜入射下的分布,因用的是近似方法,只能计算衬底表面中心线上的束流值,且不能满意解释实验结果。本文也采用R&H模型,但不附加近似假定,直接计算斜入射下整个衬底而上的束流分布,获得较满意的结果。

【Abstract】 Ruth and Hirth had calculated flux distributions using their model, but the distributions were only valid for fluxes perpendicular to the substrates. Svensson and Andersson had approximately calculated the oblique flux on the base of R & H model. However, only the flux distribution on central line could be found and S & A method was not satisfied to explain the experimental data: In this paper, oblique fluxes over whole surface of the substrate have been deriveted from R & H model without assumptions of approximation added. Better results have been obtained.

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