【摘要】 本文给出了荧光过程的蒙特卡罗模拟,着重考虑了几种散射过程对特征X射线强度的影响。对几 种纯元素,计算了单位辐射下特征X射线的强度,与实验值取得了较好的一致。更多还原

【Abstract】 Monte Carlo method has deen applied to simulate the energy dispersive X-ray fluorescence course. The influences of the scattering processes of incident line in sample upon the intensity of the characteristic X-ray have particularly been considered in the simulation model separately. The intensities of the characteristic line for some pure elements under the unit incident radiation were calculated, and good agreement was obtained between the calculated and experimental results.更多还原