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蒙特卡罗方法在X射线荧光分析中的一些应用

Application of Monte Carlo method for X-ray fluorescence analysis

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【作者】 范钦敏刘亚文李道伦韩俊英

【Author】 Fan Qinmin Liu Yawen Li Daolun Han Junying (Institute of High Energy Physics, Academia Sinica)

【机构】 中国科学院高能物理研究所中国科学院高能物理研究所

【摘要】 本文给出了荧光过程的蒙特卡罗模拟,着重考虑了几种散射过程对特征X射线强度的影响。对几 种纯元素,计算了单位辐射下特征X射线的强度,与实验值取得了较好的一致。

【Abstract】 Monte Carlo method has deen applied to simulate the energy dispersive X-ray fluorescence course. The influences of the scattering processes of incident line in sample upon the intensity of the characteristic X-ray have particularly been considered in the simulation model separately. The intensities of the characteristic line for some pure elements under the unit incident radiation were calculated, and good agreement was obtained between the calculated and experimental results.

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