【摘要】 本文报道以无透镜傅里叶全息术变换记录的全息光栅作掩膜,应用反应离子束入射角控制光栅闪耀角,选择了合适刻蚀工艺参数,制得衍射效率为67%的SiO₂全息闪耀光栅。更多还原

【Abstract】 The SiO2 holographic blazed grating with good quality and high diffraction efficiency have been developed by reactive ion beam etching and holographic grating mask made by lensless Fourier transform holography recording.We investigated the techniques of the photoresist coating, holographic exposure and development so that the mask pattern of the AZ1350 photoresist holographic grating should be made suitable for reactive ion beam etching.And then, the SiO2 holographic blazed gratings with space frequency of 1000 lines/mm are microfabricated by CF4 ion beam etching. The etching rate of SiO2 and AZ1350 photoresist has been determined.The blazed angle of gratings can be controlled by varying the incident angle of the ion beam.The advisable etching technology parameters have been chosen and the experimental results of the SiO2 holographic blazed grating with 67% diffraction efficiency have been achieved.更多还原