节点文献
GaAs中N等电子陷阱的研究
A STUDY OF NITROGEN ISOELECTRONIC TRAPS IN GaAs
【摘要】 对离子注N的GaAs样品作了77K的静压光致荧光研究。观察到了N陷阱中心元胞势束缚激子Nx的发光光谱及畸变势束缚激子N_T的发光峰。测量N_X能级的压力系数为2.8meV/kbar,常压下N的共振态高于导带边179meV。讨论了N等电子陷阱的电声子耦合强度及有效束缚激子半径随压力的变化关系。
【Abstract】 The photoluminescences of nitrogen implanted GaAs samples at 77 K have been studied under high pressures. The luminescence peaks of excitons Nx bound to N trap central cell potential and excitons NΓ bound to deformation potential were observed. The exprimen-tal value of pressure coefficient of Nx level is 2.8 meV/kbar. Under the atmospheric pressure, the N resonant state is at 179 meV above the conduction band edge. The pressure behaviors of electron-phonon coupling strength of N isoelectronic trap and effective radius of bound exciton are discussed.
- 【文献出处】 物理学报 ,Acta Physica Sinica , 编辑部邮箱 ,1984年04期
- 【被引频次】2
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