【摘要】 本文报导了从光学干涉图形来无损测定反射衬底上的薄膜厚度;介绍了TR等新处理方法,在几百埃到十微米的厚度范围内,显示了简捷可靠的优点。讨论了外延材料光学干涉图形的位置、形状与其杂质截面分布之间的关系,还提出了光学测定多重薄膜厚度的可能性。更多还原

【Abstract】 This paper reports the nondestructive thickness measurement of transparent films on a reflecting substrate through optical interference spectra, and introduces the new methods of T scale etc. The methods show the advantage of simpleness, rapidness and accurateness between several hundreds angstroms and ten microns. The relations are discussed between the location, shape of optical interference peaks on an epitaxial wafer and the impurity atoms distribution profile inside the wafer. The capability is suggested for measuring the thickness for several configurations of multi-film sandwiches through optical interference spectra.更多还原