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硅芯片多层薄膜折射率的测量
Measurement on the Refractive Index of Multi-Film in Chip
【摘要】 本文介绍一种测量透明薄膜折射率的“磨角—干涉”法。根据光干涉原理,推导了薄膜折射率的表达式n=1+△N1/△N2。此法可用于测量半导体器件和大规模集成电路芯片中的单层或多层膜的折射率。
【Abstract】 The paper presents a "Grinding Angle--Interference" method of measu-ring the refactive index of thin films. The refractive index of thin film,n=1-2△N1/△N2, is derived from the principle of interference of light. Themethod can be used to measure the refractive index of single-films, ormulti-films in chip of semicondutor devices and LSI.
- 【文献出处】 南昌大学学报(理科版) ,Journal of Nanchang University(Natural Science) , 编辑部邮箱 ,1984年03期
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