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硅功率器件的电子辐照效应及其机理

ELECTRON IRRADIATION EFFECTS IN SILICON POWER DEVICE AND AN INVESTIGATION OF ITS MECHANISM

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【作者】 钱思敏王炳林王培德刘安东黄耀先张传汉朱悟新张厥宗

【Author】 Qian Simin Wang Binglin Wang Peide Liu Andong Huang Yaoxian Zhang Chuanhan Zhu Wuxin Zhang Juezong

【机构】 北京师范大学低能核物理研究所北京师范大学低能核物理研究所北京椿树整流器厂有色金属研究总院

【摘要】 <正> 电子辐照硅功率器件是七十年代初发展起来的新工艺,它利用加速器产生高能电子流辐照硅功率器件,使硅材料晶格中的点阵原予发生位移,造成简单的品格空位和间隙原子。这些空位和问隙原子要和硅中的其它杂质、空位相互作用,组成缺陷络合物,形成了深能级的复合中心,如氧宅位对、磷空位对、双空位对等,以控制少子寿命.为了克服目

【Abstract】 Silicon power devices are irradiated by high energy electron beam which is produced by BF-5 linear electron accelerator(energy 3-5 MeV,beam current 200μA,scanning width 66cm).Recombination centres of deep energy levels controlling the life-time of minority carrier are formed in power devices. The relations between electron fluence,electron fluence rate and life-time of minority carrier have been studied.The influence of electron energy on radiation damage coefficient and VF-toff trade-off curve has also been stu- died.Except for this,the mechanisms to control life-time are investigated.

  • 【文献出处】 北京师范大学学报(自然科学版) ,Journal of Beijing Normal University(Natural Science) , 编辑部邮箱 ,1984年03期
  • 【被引频次】3
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