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分子束外延选择性掺杂的GaAs/N-GaAlAs异质结
MBE Growth of Selectively Doped GaAs/N-AlGaAs Heterostructure
【摘要】 利用分子束外延技术制备了选择性掺杂的GaAs/N-AlGaAs异质结,22K时,该结构的迁移率达到 223,000cm2/V.s,相应的薄层电子浓度为 5.7 × 1011cm-2.在低温强磁场下,观察到异质结电子系统的二维SdH振荡特性和量子化Hall效应.
【Abstract】 A selectively doped GaA3/N-AlGaA2 heterostructure with an electron mobility ashigh as 223,000 cm2/V.s and a sheet carrier concentration of 5.7×1011cm-2 at 22 K hasbeen grown by molecular beam epitaxy (MBE).SdH oscillation and quantized Hall resi-stance of two-dimensional electron gas in the heterostructure have been observed underhigh magnetic field at low temperature.
- 【文献出处】 半导体学报 ,Chinese Journal of Semiconductors , 编辑部邮箱 ,1984年06期
- 【被引频次】1
- 【下载频次】41