【摘要】 本文在一维LPCVD计算机模拟算式的基础上,考虑到反应管中,径向浓度不均匀的影响,进一步提出三维LPCVD计算机模拟算式,以便同时解决片内和片间均匀性问题.在形式上,整个三维模拟算式可以分解为片内和片间两个独立的部分,但二者是相互影响的.计算结果同一些实验结果具有相同的结论.在三维LPCVD计算机模拟的指导下,我们在研制LPCVD工艺和设备中取得了片内、片间均匀性和批间重复性都极为良好的结果.更多还原

【Abstract】 Based on one-dimensional LPCVD computer simulation formulae reported previous-ly,three-dimensional LPCVD computer simulation formula is reported so as to calcula-te within-wafer and wafer-to-wafer uniformity simultaneously.In form, this new simu-lation formula can be divided into two parts:the solution in the part of within-waferuniformity can be obtained by solving a diffusion-transference problem,while the partof wafer-to-wafer uniformity can be simulated just by one-dimensional LPCVD com-puter simulation formulae in which only the deposition areas are modified.Success hasbeen achieved in the research of LPCVD equipment and technology by using this three-dimensional LPCVD computer simulation.更多还原