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稀释气体对GD淀积a-Si:H膜的光电性质的影响

Effects of Hydrogen and Helium Dilution of Silane on the Optical and Electrical Properties of GD Deposited a-Si: H Films

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【作者】 马洪磊; 曹宝成; 李淑英; 陆大荣;

【Author】 Ma Honglei/Department of Physics, Shandong UniversityCao Baocheng/Department of Physics, Shandong UniversityLi Shuying/Department of Physics, Shandong UniversityLu Darong/Department of Physics, Shandong University

【机构】 山东大学物理系; 山东大学物理系;

【摘要】 本文研究了用氦和氢作为硅烷的稀释气体对GD淀积的a-Si:H膜的光电性质的影响.测量了用两种稀释气体GD淀积的a-Si:H膜的光电导、光学带隙、红外吸收和光致发光.实验结果表明用氦稀释硅烷GD淀积的a-Si:H膜有更低的缺陷态密度,是一种廉价薄膜太阳电池可供选择的基本材料.

【Abstract】 The effect of hydrogen and helium dilution of silane on the optical and electricalproperties of GD deposited a-Si:H films was investigated by photo-conductivity,opti-cal absorption,infrared absorption and photoluminescence measurements.The experi-mental results show that in eomparision with a-Si:H prepared from a mixture ofsilane and hydrogen,a-Si:H prepared from a mixture of silane and helium possessesa lower density of defect states,and is a kind of basic material of low cost for solarcells.

  • 【文献出处】 半导体学报 ,Chinese Journal of Semiconductors , 编辑部邮箱 ,1984年05期
  • 【被引频次】1
  • 【下载频次】20
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