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热导-火焰光度串联法测定SF6气体中的痕量杂质

A Gas Chromatographic Method for Determination of Trace Impurities in Sulfur Hexafluoride

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【作者】 夏书纲岳辅鹏王继宗

【Author】 Xia Shugang Yue Fupeng Wang Jizong (Beijing Institute of Labour Protection)

【机构】 北京市劳动保护科学研究所北京市劳动保护科学研究所

【摘要】 <正> 六氟化硫(SF6)气体做为一种优良的绝缘和灭弧介质在高压电器、高能物理、冶金等领域中的应用日益广泛。在SF6的生产和使用过程中常带入一定杂质;此外在某些外因(例如大功率电弧冲击、高温,高能粒子等)作用下其本身会发生分解并可与其它物质反应而产生若干分解产物,其中有些物质严重危害人身健康及设备安全。为此必须对SF6气体中的痕量杂质实行严格的质量监测。关于SF6气体中痕量杂质的测定已有很多论述,国际电工委员会(IEC)还专门制定了SF6气体标准分析方法,但均未提出分别定性定量测定其中危害最大的含硫氟化物

【Abstract】 A gas chromatographic method for the determination of trace impurities in SF6,such as SOF2 and SO2F2,is described.A 2m×3mm stainless steel column of 3%di-isooctyl sebacate on silica gel was used.The components were detected simultaneously by FPD and TCD in series,and GC-MS as well as IR were used for their identification.In order to avoid the contamination of FPD with large amount of SF6 and the interference of its large peak with the peaks of the impurities,a by-pass was utilized between the two detectors. Empirical calibration curves were used for accurate calculation of the contents by plotting their responses relative to that of SP6 on a log-log scale. The accuracy and precision were good and the detection limits for SOF2 and SO2F2 were 0.5 ppm and 5 ppm respectively.

  • 【文献出处】 分析化学 ,Chinese Journal of Analytical Chemistry , 编辑部邮箱 ,1983年03期
  • 【被引频次】1
  • 【下载频次】40
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