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液相外延生长的AlxGa1-XAs中Al组分分布及少子扩散长度的研究

Investigation on the Distribution of Al Composition and on the Diffusion Length of the Minority Carriers in AlxGa1-xAs Grown by LPE

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【作者】 刘宏勋陈娓兮虞丽生

【Author】 Liu Hongxun/Department of Physics, Beijing UniversityChen Weixi/Department of Physics, Beijing UniversityYu Lisheng/Department of Physics, Beijing University

【机构】 北京大学物理系北京大学物理系

【摘要】 用液相外延生长了不同x值0.2-0.8的P型和N型AlxGa1-xAs.用X光能谱法测量了厚度10μm范围内的Al组分分布.发现在厚度为5μm以内Al组分基本上是均匀的,而在5μm以外随着厚度的增加对于高Al样品x值是增高的,而对于较低Al组分样品x值降低.用EBIC方法测量了电子和空穴的扩散长度.得到在掺杂杂质浓度相同的条件下电子的扩散长度随Al组分x值的增加而减小.空穴的扩散长度则不随Al组分的变化而变化.

【Abstract】 The distribution of Al composition in P and N type AlxGa1-xAs grown by LPEand having different values of x (0.2-0.8) has been measured by X-ray energy spec-troscopy to a depth of 10 μm from the interface.It has been found that the Al composi-tion up to a depth of 5μm from interface is almost uniform but that after 5μm,x in-creases with the increasing thickness for high Al composition,while it decreases for lowAl composition.The diffusion lengths of electrons and holes (Ln,Lp),measured byEBIC method,have shown that Ln decreases with the increasing Al composition,butthat Lp is constant for all values of x.

  • 【文献出处】 半导体学报 ,Chinese Journal of Semiconductors , 编辑部邮箱 ,1983年01期
  • 【被引频次】9
  • 【下载频次】34
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