【摘要】 这里介绍的光掩模缺陷检查技术(MDI)是应用了方向性空间滤波原理,其检查速度比常规显微镜的快2-3倍,可检测的最小缺陷约为3μm.这种检查技术操作简便,为实现光掩模缺陷的自动检测打下了基础.更多还原

【Abstract】 This paper describes a practical technique to detect defects in IC photomasks bythe principle of directional spatial filtering.Its inspection speed is 2 or 3 times fasterthan that by conventional microscopes and the minimum detect size is around 3μm.This method is very easy to operate and is to provide a userul technique for automaticphotomask defect inspection.更多还原