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溅射离子泵的抽速计算

Calculation of Pumping Speed of Sputtering Ion Pump

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【作者】 何炜王仁康耿天鹏胡国华

【Author】 Ho Wei,Wang Ren-Kang and Geng Tian-peng (Qinghua University, Beijing,) Hu Gua-hua (Shenyang Educational Instruments Factory,Shenyang)

【机构】 清华大学清华大学沈阳教学仪器厂

【摘要】 至今,溅射离子泵的抽速用半经验公式S=K(I/P)表示,其常数K由实验确定。本文沿用Schuurman的磁约束气体放电理论,结合Sigmund援引Lindhard的原子碰撞公式所建立的溅射理论,并根据Langmuir的吸附理论,尝试从理论上求得二极型离子泵室温下对氮气抽速公式中常数X的表达式为;K=4.9×10-3cfUa1/4(g+2-(g2+4g)1/g2+4g)。其中,常数c与泵的结构有关;函数f取决于压强;Ua为阳极电压;g=2.45×10-3cfUa1/4I/PA。而A为阳极内表面面积。此关系式与实验结果比较相符。

【Abstract】 Until now,a semi-empirical formula S=K(I/P) is widely used to express the pumping speed of a sputtering ion pump. The constant K is decided by experiments. An attempt is made to find this constant by the Schuurman’ s theory of magnetic confined gas discharge Lindhard’s expression for atomic collision cross section introduced by Sigmund to the theory of sputtering, and the Langmuir’s theory of adsorption.It is found that K may be expressed as K=4.9×10-3 fUa(1/4) (g+2-g2+4g(1/2) ), for nitrogen at room temperature in a diode pump,where c is a configuration factor, f is a pressure-dependent factor,u is a anode voltage. g=2.45×10-3cfUa(1/4)/PA, Where A is the area of the inner surface of the anode.This relation is agreed with experimental results fairwell.

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