【摘要】 本文研究了半绝缘砷化镓中硅离子的注入,在对衬底材料进行挑选和注意离子源工作物质纯度的基础上,进行了²⁸Si⁺注入,用无包封法退火,然后对注入层作了电学性质、背散射和光致发光谱测定,结合选择离子注硅的UHF应用的低噪声GaAs双栅MES FET的结果,1GHz下NF0.9dB和Ga 10dB,对实验结果进行了讨论。更多还原

【Abstract】 Semi-insulating GaAs substrates doped with chromium were implanted with 120-160 keV²⁸Si+ ions (10¹²-10¹³ cm（-2） at room temperature. After thermal annealing, the carrier concentration and mobility profiles, residual damage and impurity levels of implanted wafer were determined by C-V method, back scattering technique and photo-1uminescence spectra. The results showed that the semi-insulating GaAs substrate selection and （28）Si+ beam purity control are necessary to obtain reproducible and high activation implantation. Fabricated with multiple localized silicon implantation for both active and contact layer, GaAs dual-gate MES FET applicated in UHF TV tuner reached a noise figure of 0.9 dB and an associated gain of 10 dB at 1 GHz. The mobility profile and appropriate annealing temperature are discussed on the basis of the present experimental results.更多还原