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硅外延反应器中氢与石墨热化学反应的研究
The Study of Heating Chemical Reaction of Hydrogen with Graphite in Epitaxial Silicon Reactor
【摘要】 在氢气中,石墨在高温下不是一种化学稳定的物质.本文叙述在开管系统条件下,用气相色谱分析的方法对硅外延系统中氢与石墨的热化学反应产物作了检测.实验结果表明,在1050~1250℃外延温度范围内可明显地观察到甲烷、乙炔、乙稀等碳氢化合物,它们在H2中浓度有的可达几十ppm*.在整个外延生长过程中,特别是在生长起始阶段,这些反应产物有可能对H2带来沾污,并对外延晶体完整性产生一定影响.文中也报道了石墨基座在不同涂层材料如硅、碳化硅等包涂条件下,氢与石墨反应产物相应减少的结果.
【Abstract】 Graphite has been shown to react with hydrogen at high temperature. This paper reports a chromatography study of the reaction products in ithe graphite-hydrogen reaction using a horizontal open tube system widely employed today for the growth of silicon layers. The methane, acetylene and ethylene formed in the graphite-hydrogen reaction at 1050-1250℃ have been detected.
- 【文献出处】 固体电子学研究与进展 ,Research & Progress of Solid State Electronics , 编辑部邮箱 ,1982年04期
- 【被引频次】1
- 【下载频次】74