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用射频溅射设备制备超导铌膜

PREPARATION OF SUPERCONDUCTING NIOBIUM FILMS BY USING A RF SPUTTERING APPARATUS

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【作者】 徐凤枝杨沛然陈烈曾佩韦邹鹏程邱尚湧

【Author】 Xu Fengzhi, Yang Peiran and Chen Lie(Institute of Physics, Academia Sinica)Zeng Peiwei, Zou Pengcheng and Qiu Shangyoug (Changehim College of Geology)

【机构】 中国科学院物理研究所长春地质学院长春地质学院

【摘要】 本文详细地介绍了在高真空射频溅射镀膜机上制备超导铌膜的方法.由于采用了衬底加热、长时间预溅射、扩散泵口加液氮冷阱、提纯氩气等方法,制出的厚铌膜T_c为9.1K,接近大块铌材的T_c值.不加任何保护的铌膜可长时间放置在大气中,性能基本不变.

【Abstract】 In this paper, a full account is given of the deposition technology of the Nb films with a conventional high vacuum EF sputtering apparatus. By heating the substrate, purifying the argon, taking a long-term presputtering and using diffusion pump with liquid nitrogen trap, we can obtain the Nb films which possess adequate stability and good superconducting property which meet our needs in making Josephson devices. The critical temperature of the thick films is 9.1 K, being close to the Tc of the bulk material. No obvious change is found in the property of our Nb films after their exposure to the atmosphere for weeks.

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