【摘要】 <正> 从1977年开始对离子束刻蚀作了一些初步地探索。先后做过束径为φ20mm,φ84mm和φ135mm的离子束刻蚀装置,并作了一些刻蚀试验,取得了初步的成效。本文介绍束径为φ135mm,立式、风冷、两维旋转水冷工作台的离子束刻蚀试验机的设计、调试、性能和刻蚀试验的初步结果。更多还原

【Abstract】 The design, measurements and performances of an experimental ion beam etching system （SD—3） are described. The system has an upright structure, a Kaufman argon ion Source, a beam diameter of 135mm and a twodimensional revolving target with water cooling. The argon ion energy can be varied in the range of 300～2000ev, with beam currents 0.8mA/cm² at 500ev and 1.2mA/cm² at 800ev. The pressure in the terget chamber is usually 2×10^-4 torr. The beam diameter on the target plane is within 80mm and the uniformity of beam current density is ±5%, when theion energy in the renge 300～1000ev. Quartz crystal resonators, manufactured by ion beam thinning with thissystem, operate at fundamental frequencies up to 138MH_z, with a low series resistance<20Ω.更多还原