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用于液晶显示器件的旋转倾斜蒸镀SiO法

The Method of Evaporation SiO Thin Film onto the Rotation Substrate for Liquid Crystal Display Devices

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【作者】 王良御; 蔡瑞年; 何秀芳;

【Author】 Wang Liang-yu, (Department of Fundamental Courses, Tsinghua University) Cai Re-nian, (Peking Geologic Instrument Factory), Heo Xiu-fang, (Peking Chemical Factory)

【机构】 清华大学基础课; 北京地质仪器厂; 北京化工厂;

【摘要】 旋转倾斜真空蒸发SiO的方法能同时蒸镀多个基片,并且可在蒸发源和基片距离较短时蒸发。 拍摄了SiO薄层的电子显微镜照片。用上述方法制作了三种液晶显示器件。

【Abstract】 In this paper, a method of vacuum evaporation sic onto a rotating tilt substrate is presented. This method enables more substrate to be evaporated simultaneously and with shorterd distance between the evaporation source and the substrate, Has been presented an electron microgaph of thin silicon monoxide film. Threeliquid crystal display devices using the new method are described.

  • 【文献出处】 清华大学学报(自然科学版) ,Journal of Tsinghua University(Science and Technology) , 编辑部邮箱 ,1978年03期
  • 【下载频次】70
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