【作者】 王玉新；

【导师】 冯克成；

【作者基本信息】 长春理工大学 ， 光学， 2005， 博士

【摘要】 硼碳氮(BCN)是一种新型的人工合成功能材料，它具有一系列优异的物理化学特性，有着极其广泛的应用前景。近几年来，硼碳氮薄膜的制备和性能研究已逐步成为国际上薄膜研究的热点。目前，硼碳氮薄膜的研究还处于初级阶段，制备方法以化学气相沉积为主。同时，各种PVD方法也被用来制备硼碳氮薄膜，如溅射法、离子束辅助沉积和脉冲激光沉积等。对该化合物的性能研究主要集中在力学和一部分电学性质方面，它的光学特性研究的比较少。并且，在溅射沉积法中，采用磁控溅射技术并直接用六角氮化硼和石墨为溅射靶制备BCN薄膜的情况十分罕见。本文即以六角氮化硼和石墨为溅射靶，采用射频磁控溅射技术分别在硅和玻璃衬底上制备了无定型的硼碳氮薄膜，并对其光透过性质进行了系统的研究。 在论文的第一部分，首先对薄膜的定义、薄膜材料的研究现状及发展前景等问题进行了综述。介绍了课题选择的背景，讨论了金刚石薄膜和立方氮化硼薄膜性能的优缺点，对制备兼具二者优点的硼碳氮薄膜的可行性进行了分析，并着重从理论和实验两方面阐述了硼碳氮薄膜的研究现状和存在的问题。 在论文的第二部分，介绍了溅射镀膜的基本原理，并用射频磁控溅射法成功制备了硼碳氮薄膜，得到制备实现原子级化合的硼碳氮薄膜的合适的实验条件为：靶到衬底的距离5cm、工作气压1.3Pa、射频功率80～130W、氮气分压比1／10～2／3、沉积温度300～500℃、沉积时间1～4h、衬底偏压为0V。所制备样品由傅里叶变换红外光谱、X-射线光电子能谱、X-射线衍射、原子力显微镜及扫描电子显微镜等检测手段进行了表征。测量结果表明薄膜中B、C和N原子实现了原子级杂化，且薄膜为无定型结构并具有平坦的表面，薄膜厚度约为50nm～300nm。 在论文的第三部分，系统地研究了热处理和沉积参数对硼碳氮薄膜的生长和内应力的影响。结果表明，新制备的硼碳氮薄膜中存在较大的压应力，对其进行600℃热处理能有效释放薄膜中的压应力。另外，改变沉积参数也可减小薄膜中的压应力，实验结果表明制备具有较小的压应力的硼碳氮薄膜的最佳沉积条件更多还原

【Abstract】 Boron carbon nitride （BCN） attracts widespread interest as a promising technical material for many potential applications because of its unique physical and chemical properties. In recent years, both preparation and investigation on properties of this material have been became new hot points. The BCN thin films have been mainly synthesized by chemical vapor deposition （CVD）. And other PVD methods, such as sputtering deposition, ion beam assisted deposition, and pulsed laser deposition, are also used to prepare BCN thin films. At present, more attentions have been focused on their mechanical and some electronic properties. It is important to note the optical properties of BCN thin films. And among the sputtering deposition methods, magnetron sputtering is quite limited as yet. Directly sputtering from h-BN and graphite targets has rarely been attempted. In this dissertation, the amorphous BCN thin films were deposited by radio frequency （RF） magnetron sputtering method on Si and glass substrates, respectively, the target is h-BN and graphite. And their transmission properties were investigated.In the first part of the dissertation, the author summarized the definition of thin films, the present situation and the bright future of thin film materials. The author introduced the background of the project, mainly discussed the advantages and defects of diamond and c-BN thin films, and analyzed the feasibility of preparing BCN thin films with their advantages. The author theoretically and experimentally summarized the present situation and problems of BCN thin films.In the second part of the dissertation, the author introduced the basic principles of sputtering and preparation of BCN thin films by RF magnetron sputtering technique. The most appropriate deposition parameters were found. They are target-substrate of 5cm, total work pressure of 1.3Pa. sputtering power of 80-130W, N₂ partial pressure of 1/10-2/3, deposition temperature of 300-500℃, sputtering time更多还原